Handbook of Plasma Processing Technology: Fundamental,...

Main
Engineering
Handbook of Plasma Processing...

Handbook of Plasma Processing Technology: Fundamental, Etching, Deposition and Surface Interactions (Materials Science and Process Technology)

Stephen M. Rossnagel, William D. Westwood, Jerome J. Cuomo

0 / 0

كم أعجبك هذا الكتاب؟

ما هي جودة الملف الذي تم تنزيله؟

قم بتنزيل الكتاب لتقييم الجودة

ما هي جودة الملفات التي تم تنزيلها؟

This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.

الفئات:

عام:

1991

الإصدار:

1

الناشر:

William Andrew

اللغة:

english

الصفحات:

546

ISBN 10:

0815512201

ISBN 13:

9780815512202

ملف:

PDF, 26.71 MB

IPFS:

,

english, 1991

تنزيل هذا الكتاب غير متاح بسبب شكوى من صاحب حقوق النشر والطبع

Beware of he who would deny you access to information, for in his heart he dreams himself your master

— Pravin Lal

قد تكون في قائمة إهتماماتك

Umran S. Inan, Marek Gołkowski — Principles of Plasma Physics for Engineers and Scientists

Steven H. Simon — The Oxford Solid State Basics

Robert A. Meyers (Editor-in-Chief) — Encyclopedia of Physical Science and Technology - Materials

Y.J. Chan, C.K. Lin, H.C. Chiu and S.C. Yang — Nano Lithography and Etching Technologies

Vossen, John L.; Kern, Werner(eds.) — Thin Film Processes II

Maurice H. Francombe and John L. Vossen (Eds.) — Plasma Sources for Thin Film Deposition and Etching

Riccardo d'Agostino, Daniel L. Flamm and Orlando Auciello (Eds.) — Plasma Deposition, Treatment, and Etching of Polymers

Dennis M. Manos and Daniel L. Flamm (Eds.) — Plasma Etching. An Introduction

— Chemical Mechanical Polishing in Silicon Processing

Panel on Opportunities in Plasma Science and Technology — Plasma Science: From Fundamental Research to Technological Applications

Liu, Wei; Minati, Luca; Speranza, Giorgio — Applications of plasma technologies to material processing

Tina L. Lamers, Beth L. Pruitt (auth.), Reza Ghodssi, Pinyen Lin (eds.) — MEMS Materials and Processes Handbook

RONALD A. POWELL (Eds.) — Dry Etching for Microelectronics

Chris Mack — Fundamental Principles of Optical Lithography: The Science of Microfabrication

John R. Dean — Practical Inductively Coupled Plasma Spectroscopy

Chapman B., — Glow discharge processes. Sputtering and plasma etching

Joseph M. Steigerwald, Shyam P. Murarka, Ronald J. Gutmann — Chemical Mechanical Planarization of Microelectronic Materials

Alexander Fridman — Plasma Chemistry

A. Yoshizawa, S.I. Itoh, K. Itoh — Plasma and fluid turbulence: theory and modelling

Stephen M. Rossnagel, William D. Westwood, Jerome J. Haber — Handbook of plasma processing technology: fundamentals, etching, deposition, and surface interactions

Wasa K., Kanno I., Kotera H. (Eds.) — Handbook of Sputter Deposition Technology. Fundamentals and Applications for Functional Thin Films, Nano-Materials and MEMS

Fridman, Alexander; Kennedy, Lawrence A — Plasma Physics and Engineering, Second Edition

Cheol Seong Hwang, Cha Young Yoo (auth.), Cheol Seong Hwang (eds.) — Atomic Layer Deposition for Semiconductors

Paul K Chu — Low temperature plasma technology : methods and applications

Seshan, Krishna (Eds.) — Handbook of Thin Film Deposition - Techniques, Processes, and Technologies

Nicolas Posseme — Plasma Etching Processes for Interconnect Realization in VLSI

Mertens, Paul; Meuris, Marc; Heyns, Marc — Ultra Clean Processing of Semiconductor Surfaces XI

Michael Kohler — Etching in Microsystem Technology

John Ernest Harry — Introduction to Plasma Technology

Declan Diver — Plasma formulary for physics, technology, astrophysics

Riccardo d'Agostino, Pietro Favia, Christian Oehr, Michael R. Wertheimer — Plasma processes and polymers

Riccardo d'Agostino, Pietro Favia, Yoshinobu Kawai, Hideo Ikegami, Noriyoshi Sato, Farzaneh Are — Advanced Plasma Technology

Francisco L. Tabarés — Plasma Applications for Material Modification: From Microelectronics to Biological Materials

N. A. G. Ahmed — Ion Plating Technology: Developments and Applications

Lindas Pranevicius — COATINGS TECHNOLOGY HANDBOOK, Third Edition

Chen F.F., Chang J.P., (2002) — Lecture Notes on Principles of Plasma Processing – Plenum-Kluwer

C. Y. Chang, S. M. Sze — Ulsi Technology

Professor K.S. K.S Sree Harsha — Principles of Physical Vapor Deposition of Thin Films

Norman G. Einspruch — Plasma Processing for VLSI

Ohring M. — Materials science of thin films

Maurice H. Francombe and John L. Vossen (Eds.) — Physics of Thin Films: Advances in Research and Development

John L. Vossen (Auth.) — Thin Film Processes

أكثر المصطلحات والعبارات المستخدمة